Xinjiang Institute of Physics and Chemistry, Chinese Academy of Sciences introduced the high vacuum CVD system designed and produced by our company, and Mr. Wang of the Institute gave full affirmation to our products and services!

CVD system HR1200-110ITD3F
Equipment introduction:

Chemical vapor deposition (CVD) refers to the reaction of chemical gases or vapors on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit thin film materials, including a wide range of insulating materials, as well as most metal materials and metal alloy materials. To this end, we have developed a complete set of CVD coating system, which is suitable for major university material laboratories, scientific research institutes, environmental science and other fields;

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