Plasma enhanced rotary PECVD system-Pendulum Rotary Furnace-高温炉生产厂家

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Plasma enhanced rotary PECVD system

Release time：2022-03-21 Number of views：532

Equipment introduction：

Rotary pendulum PECVD system is suitable for thin film deposition on the surface of powder materials. The system is composed of high power RF power supply (500W, 13.56MHz), gas mass flow control system, vacuum system and rotary pendulum system. It adopts Nobardi operating software of NBD-101EP centralized bus control technology. Plasma properties are used to control or influence the process of gas reaction and chemical reaction on the material surface and to deposit thin films at appropriate temperatures. PECVD deposited films have excellent electrical properties, good substrate adhesion and excellent step coverage. Because of these advantages, it has a wide range of applications in VLSI, photoelectric devices, MEMS and other fields.

Configuration

	Main features: 1, the maximum output power of RF power supply: 500W (continuously adjustable), the maximum reflected power 70W; 2. Excellent electromagnetic shielding scheme, efficient and safe! 3, special-shaped high purity quartz furnace tube, large capacity reaction space; 4, unique rotation (60 precision design) pendulum structure, to ensure the material and plasma full contact; 5, three high precision mass flowmeter (can be customized according to requirements), integrated gas mixing system; 6. Unique inlet and outlet design ensures convenient inlet and outlet of equipment under complex structure; 7, RF system, vacuum system, rotary pendulum system is fully integrated in one, 7 inch full touch screen operation, easy to operate, intuitive; 8, can save six groups of process parameters, at any time to call; 9, the experimental data can be automatically screenshot, and support USB interface export.
Electrical Spec	AC220V 1.5KW
Dimension of equipment	W1300mm×H1250mm×D760mm；
Reaction chamber	Φ120*L300mm (can be customized, three groups of mixing baffle welding inside), non-RF area diameter: φ60mm;
Turnover speed	0.1 ~ 6 R/min (stepless speed regulation);
Overturning Angle	-3°～+3° The maximum pouring Angle is 30°
Reaction chamber pressure	5~80pa
法兰结构	航空铝快开模式；
操作系统	NBD-101EP集中总线控制集成系统，7"真彩触摸屏操控，智能模糊PID 控制；智能式人机对话模式；
电动推杆功率	50W
RF 电源	输出功率10～500W 任意连续可调，射频频率: 13.56MHz ±0.005% ，全自动匹配；
真空测试	数字真空计获取装置；
真空获取	NBD-4C机械真空泵(220V/50Hz)，功率：0.4KW，抽速：4m³/h；
供气系统	质量流量控制器（量程及标定可定制）精度：±1%F.S；响应时间：1-4秒；
设备细节
控制系统		1、烧结工艺曲线设置：动态显示设置曲线，设备烧结可预存多条工艺曲线，每条工艺曲线可自由设置； 2、可预约烧结，实现无人值守烧结工艺曲线烧结； 3、实时显示烧结功率电压等信息并记录烧结数据，并可导出实现无纸记录； 4、具有实现远程操控，实时观测设备状态； 5、温度校正：主控温度和试样温度的差值，烧结全程进行非线性修正。
部分界面
净重	约320KG
设备使用注意事项	1.射频匹配器一般处于自动匹配状态，一般功率需达到50W以上才能匹配； 2.若采用手动匹配，将功率设到60W左右，手动调谐匹配合适时，再增加功率 3.工作时，需改变腔体的气流量，先要要把功率设置为零，不能直接按“OFF”按键关闭射频输出。
服务支持	一年有限保修，提供终身支持；