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High-Temperature Chemical Vapor Deposition System

Add Time: 2026-01-15    View:235

-- A cutting-edge material synthesis platform for high-crystalline quality thin films, wide bandgap semiconductors, and advanced ceramic coatings. High-temperature CVD systems refer to chemical vapor deposition equipment with an operating temperature of ≥1000°C (typically 1000–1700°C). By activating precursor gases at high temperatures, thermal decomposition or chemical reactions occur on the substrate surface, resulting in the formation of functional thin films or coatings with high compactness...

  

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Features of the equipment:

Essential differences from conventional CVD: no plasma assistance required (pure thermal drive), avoiding ion damage; high atomic migration rate → complete film crystallization and fewer defects; suitable for high melting point materials (such as SiC, GaN, diamond, BN).

Device Name

tubular furnace

Specification Model

NBD-T1500-80TI

power supply

Single-phase 220V 50Hz

rated power

3.0KW

temperature control accuracy

±1℃

heating element

High-purity silicon carbon rod

sensor type

Type S thermocouple

Tmax

1500℃

Long-term operating temperature

1450℃

Recommended heating rate

≤10℃/min

Furnace temperature zone dimensions

Φ150*310mm

Tube specification

Corundum tube φ80*1000mm (inner diameter 70mm)

intake control

One-way float flowmeter 20-200ml/min

automatic gas mixing cabinet

             Power supply: AC220V 50HZ  Two-channel mass flowmeter: 3L/min

                     Vacuum pump type: DRV5 KF25 interface

furnace body dimensions

           Tube furnace: length 1140mm, height 740mm, depth 580mm

        Automatic air mixing cabinet: length 1115mm*height 785mm*depth 680mm

furnace body weight

Tube furnace: about 80KG; automatic gas mixing cabinet: about 90KG

1. Characteristics and main application areas of gas mixing cabinet

A Mass gas flow controller (meter), abbreviated as MFC (MFM), is a device that precisely measures and controls the mass flow rate of gas.

Features of S500 mass flow controller (flowmeter):

☆ High pressure resistance and suitable for operation under vacuum conditions. Low pressure drop. Wide operating pressure range, with gas flow not changing due to temperature or pressure variations.

The main body is constructed with stainless steel (316L) and sealed with materials such as VITON and polytetrafluoroethylene. It is suitable for various corrosion-resistant gases. The circuit board, valve body, spring leaf, precision resistor, and other important components all meet strict incoming standards.

☆ It features high accuracy, good repeatability, fast response speed, soft start, and stable and reliable operation.

☆ Can be installed at any position. Electrical operation control display, easy to use. Easy to coordinate with electrical systems or automatic control systems.

☆ When paired with the MT-60 series flow totalizer, it can accurately measure the instantaneous and cumulative flow of gas.

The flow rate of a mass flow controller (flowmeter) is typically calibrated with nitrogen (N2) before leaving the factory.

The unit of mass flow rate is mL/min (milliliters per minute); (SCCM industry standard)

L/min (liter per minute). (SLM industry standard)

The standard state is: temperature ---- 273.15K (0℃);

            Atmospheric pressure - 101325Pa (760mmHg).

F. S (Full Scale): indicates the full-scale value

Traffic Specification

5,10,30,50,100,200,300,500)mL/min

1,2,3,5,10)L/min

Control valve type

Electromagnetic regulating valve

Regulating valve in static state

normally closed

accuracy

±1.5%F.S

linear

±1.5%F.S

repeatability accuracy

±0.2%F.S

response time

≤4秒(T95)

Operating pressure difference range

50~300)kPa;(100~300)kPa(10L/min)

pressure resistance

3MPa

Working environment temperature

5~45)℃

material

Stainless Steel 316L

Standard sealing materia

VITON,    EPDM,  Or other options specified by the user

leak rate

1×10-8Pa.m3/s

joint

Φ6mm~Φ10mm, 1/4″Swagelok。1/4″VCR。Or other options specified by the user

Input and output signals

(0~+5.00)V (input impedance ≥100KΩ, load output current capability ≤3mA)

power supply

±15V(±5%)(+15V  50mA,  -15V  200mA)

Overall dimensions mm

127 (width) × 102 (height) × 28 (thickness)

Weight kg

0.8

control system

1. Sintering process curve setting: Dynamic display of set curves, with multiple process curves pre-stored for equipment sintering, and each process curve can be freely set;

2. Sintering can be scheduled, enabling unattended sintering process curve sintering;

3. Display sintering power, voltage, and other information in real-time, record sintering data, and enable paperless recording through export;

4. Capable of achieving remote control and real-time observation of equipment status;

5. Temperature correction: The difference between the main control temperature and the sample temperature undergoes nonlinear correction throughout the entire sintering process.

temperature accuracy

+/- 1℃

Precautions for equipment use

1. When the temperature of the equipment furnace chamber is ≥300℃, it is forbidden to open the furnace chamber to avoid injury;

2. Slight cracks caused by continuous use of the furnace are normal and do not affect the normal use of the equipment;

Service Support

1-year warranty with lifetime support provided (excluding consumable parts within the warranty scope).



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Address:No. 181 Zhengxin Road, Xinzheng City, Zhengzhou, Henan Province