Liquid-gas CVD all-in-one machine-河南诺巴迪材料科技有限公司

Liquid-gas CVD all-in-one machine

Release time: 2022-10-29 9:01:19 Number of views: 407

Equipment introduction:

Chemical vapor deposition (CVD) refers to the reaction of chemical gases or vapors on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit thin film materials, including a wide range of insulation materials, as well as most metal materials and metal alloy materials. To this end, we developed a complete set of CVD coating system, which is suitable for material laboratories, scientific research institutes, environmental science and other fields;

This equipment is customized based on customer requirements in the field of new energy. The reaction gases include inflammable and explosive, poisonous and harmful gases, and liquid gasification through the gas phase generator. Multi-channel mass flowmeter precisely controls intake volume. High precision pressure sensor, solenoid valve, gas detector, alarm and exhaust treatment tank, to ensure the safe, efficient and harmless discharge of working process.

Configuration：

	1. Ensure anaerobic working environment through high-precision oxygen analyzer; 2. In the shaped quartz cavity based on the rotating pendulum structure, the material can fully contact with the reaction gas to the maximum extent in a stable and uniform temperature field; 3. Unique suspended gas phase generator, can always maintain horizontal and stable output while the working chamber oscillates; 4. Multi-channel mass flow controller, which can accurately control gas flow; 5. High sealing connection technology, to ensure that combustible gas and toxic and harmful gas without any leakage, high sensitivity pressure sensor and solenoid valve can ensure that the pressure inside the working chamber is always in the set range; 6. The inflammable and explosive and toxic and harmful gas detector is linked with the device, which can obtain real-time data in time and take corresponding closing measures. At the same time, the two alarm devices can give an early warning when the alarm value exceeds the set alarm value; 7. The exhaust gas discharged from the working chamber is treated harmlessly through the exhaust gas treatment tank.
Model	NBD-RT1200-120T2D5ZYW-N
power supply	Three-phase 380V 50HZ
Temp Accuracy	±1℃
rated power	8KW
Thermocouple type	Type K thermocouple 250mm
Tmax	1100℃
Size of heating zone	φ150*430mm
Tube material	High purity quartz
Furnace tube volume	5L
Effective volume of sample	500ml
angle of inclination	-20 degrees (discharge) ~3 degrees (feed)
Tube speed	0.1~12.6 r/min
Furnace body size	Length 1550× depth 830× height 1360mm (including acetylene alarm 2160mm)
Recommended heating rate	10℃/min
Net weight	Approx.260KG
Control system		1, sintering process curve setting: dynamic display setting curve, equipment sintering can prestore multiple process curves, each process curve can be set freely; 2, can be booked sintering, unattended sintering process curve sintering; 3, real-time display of sintering power and voltage information and record sintering data, and can be exported to achieve paperless record; 4, with remote control, real-time observation of equipment status; 5. Temperature correction: the difference between the main control temperature and the sample temperature, and the whole sintering process is nonlinear correction.
* Support non - calibration, more models, welcome to call 400-000-3746

Disclaimer:

The product introduction content of this site (including product pictures, product descriptions, technical parameters, etc.) is for reference only. There may be some difference between the stated content and the actual situation due to the delay in updating. Please contact our customer service staff for confirmation. The information provided by this Site does not constitute any offer or acceptance. NOBODY will improve and modify any information on this site from time to time without prior notice.

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Equipment introduction:

Chemical vapor deposition (CVD) refers to the reaction of chemical gases or vapors on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit thin film materials, including a wide range of insulation materials, as well as most metal materials and metal alloy materials. To this end, we developed a complete set of CVD coating system, which is suitable for material laboratories, scientific research institutes, environmental science and other fields;

This equipment is customized based on customer requirements in the field of new energy. The reaction gases include inflammable and explosive, poisonous and harmful gases, and liquid gasification through the gas phase generator. Multi-channel mass flowmeter precisely controls intake volume. High precision pressure sensor, solenoid valve, gas detector, alarm and exhaust treatment tank, to ensure the safe, efficient and harmless discharge of working process.

Configuration：

	1. Ensure anaerobic working environment through high-precision oxygen analyzer; 2. In the shaped quartz cavity based on the rotating pendulum structure, the material can fully contact with the reaction gas to the maximum extent in a stable and uniform temperature field; 3. Unique suspended gas phase generator, can always maintain horizontal and stable output while the working chamber oscillates; 4. Multi-channel mass flow controller, which can accurately control gas flow; 5. High sealing connection technology, to ensure that combustible gas and toxic and harmful gas without any leakage, high sensitivity pressure sensor and solenoid valve can ensure that the pressure inside the working chamber is always in the set range; 6. The inflammable and explosive and toxic and harmful gas detector is linked with the device, which can obtain real-time data in time and take corresponding closing measures. At the same time, the two alarm devices can give an early warning when the alarm value exceeds the set alarm value; 7. The exhaust gas discharged from the working chamber is treated harmlessly through the exhaust gas treatment tank.
Model	NBD-RT1200-120T2D5ZYW-N
power supply	Three-phase 380V 50HZ
Temp Accuracy	±1℃
rated power	8KW
Thermocouple type	Type K thermocouple 250mm
Tmax	1100℃
Size of heating zone	φ150*430mm
Tube material	High purity quartz
Furnace tube volume	5L
Effective volume of sample	500ml
angle of inclination	-20 degrees (discharge) ~3 degrees (feed)
Tube speed	0.1~12.6 r/min
Furnace body size	Length 1550× depth 830× height 1360mm (including acetylene alarm 2160mm)
Recommended heating rate	10℃/min
Net weight	Approx.260KG
Control system		1, sintering process curve setting: dynamic display setting curve, equipment sintering can prestore multiple process curves, each process curve can be set freely; 2, can be booked sintering, unattended sintering process curve sintering; 3, real-time display of sintering power and voltage information and record sintering data, and can be exported to achieve paperless record; 4, with remote control, real-time observation of equipment status; 5. Temperature correction: the difference between the main control temperature and the sample temperature, and the whole sintering process is nonlinear correction.
* Support non - calibration, more models, welcome to call 400-000-3746

Disclaimer:

The product introduction content of this site (including product pictures, product descriptions, technical parameters, etc.) is for reference only. There may be some difference between the stated content and the actual situation due to the delay in updating. Please contact our customer service staff for confirmation. The information provided by this Site does not constitute any offer or acceptance. NOBODY will improve and modify any information on this site from time to time without prior notice.

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