Plasma enhanced rotary PECVD system
Release time: 2022-03-21 16:28:28 Number of views: 856
Equipment introduction:
Rotary pendulum PECVD system is suitable for thin film deposition on the surface of powder materials. The system is composed of high power RF power supply (500W, 13.56MHz), gas mass flow control system, vacuum system and rotary pendulum system. It adopts Nobardi operating software of NBD-101EP centralized bus control technology. Plasma properties are used to control or influence the process of gas reaction and chemical reaction on the material surface and to deposit thin films at appropriate temperatures. PECVD deposited films have excellent electrical properties, good substrate adhesion and excellent step coverage. Because of these advantages, it has a wide range of applications in VLSI, photoelectric devices, MEMS and other fields.



Configuration
![]() | Main features: | |||
Electrical Spec | AC220V 1.5KW | |||
Dimension of equipment | W1300mm×H1250mm×D760mm; | |||
Reaction chamber | Φ120*L300mm (can be customized, three groups of mixing baffle welding inside), non-RF area diameter: φ60mm; | |||
Turnover speed | 0.1 ~ 6 R/min (stepless speed regulation); | |||
Overturning Angle |
-3°~+3° The maximum pouring Angle is 30° | |||
Reaction chamber pressure | 5~80pa | |||
Flange structure | Aerospace aluminum quick-opening mode;; | |||
operating system |
NBD-101EP centralized bus control integrated system, 7 "true color touch screen control, intelligent fuzzy PID control; Intelligent human-machine dialogue mode; | |||
Electric push rod power | 50W | |||
RF power supply | Output power can be continuously adjusted from 10 to 500W, RF frequency: 13.56MHz ± 0.005%, fully automatic matching; | |||
vacuum test | Digital vacuum gauge acquisition device; | |||
Vacuum acquisition | NBD-4C mechanical vacuum pump (220V/50Hz), power: 0.4KW, pumping speed: 4m ³/h; | |||
Gas supply system | Mass flow controller (range and calibration can be customized) accuracy: ± 1% F.S; Response time: 1-4 seconds; | |||
Equipment Details | |
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control system | ![]() | 1. Sintering process curve setting: dynamically display the set curve, and the equipment sintering can pre store multiple process curves, each of which can be freely set; 2. Pre order sintering is available to achieve unmanned sintering process curve sintering; 3. Real time display of sintering power, voltage and other information, recording of sintering data, and the ability to export for paperless recording; 4. Capable of remote control and real-time observation of equipment status; 5. Temperature correction: The difference between the main control temperature and the sample temperature is nonlinearly corrected throughout the sintering process. | ||
Partial interface | | |
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net weight | About 320KG | |||
Equipment usage precautions |
1. The RF matching device is generally in automatic matching mode, and the power needs to reach 50W or more to match;
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Service Support | One year limited warranty, providing lifelong support; |
Disclaimer: The product introduction content on this website (including product images, product descriptions, technical parameters, etc.) is for reference only. Due to delayed updates, there may be some discrepancies between the content and the actual situation. Please contact our customer service personnel for confirmation. The information provided on this website does not constitute any offer or commitment. Nuobadi Company may periodically improve and modify any information on the website without prior notice.
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Phone: 400-000-3746
0371-6320 2805
After-sales service: 0371-6320 2805
MR. CAI: 181-0371-5723
Mr.Gao: 188-3829-0747
Ms.Huang: 188-3829-0748
Email : nbd@nbdkj.com
Address:8# zhuyuan, Xinhua subdistrict, Xinzheng, Zhengzhou, China