Chemical vapor deposition CVD all-in-one machine

Release time: 2021-04-14 10:17:11  Number of views: 1631

Equipment Introduction:
Chemical vapor deposition (CVD) refers to the method of synthesizing coatings or nanomaterials by reacting chemical gases or vapors on the surface of a substrate. It is the most widely used technique in the semiconductor industry for depositing thin film materials, including a wide range of insulating materials, as well as most metal materials and metal alloy materials. We have developed a complete CVD coating system for this purpose, which is suitable for material laboratories, research institutes, environmental science and other fields in major universities;


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设备特点

Equipment features
1. The integration of the furnace body and control system makes the experiment convenient, fast, and intuitive.
2. Configure a float flowmeter or mass flowmeter mixed gas path, and the gas flow rate can be set separately.
3. Precise PID program multi-stage control to achieve multi stage temperature and time monitoring for different processes.
4. The furnace lining is made of high-purity alumina lightweight fiber material, which has excellent insulation effect.
5. Equipped with mechanical pumps or molecular vacuum pumps, different vacuum conditions can be achieved.

PRODUCT MODEL

NBD-T1700-80TIG3Z

operation temperature

≤1650℃

Heating zone size

310mm
Size of constant temperature zone

220mm

heating rate

≤20℃/min

Electrical specifications

AC220  4.5KW
control system

1. Sintering process curve setting: dynamically display the set curve, and the equipment sintering can pre store multiple process curves, each of which can be freely set;
2. Pre order sintering is available to achieve unmanned sintering process curve sintering;
3. Real time display of sintering power, voltage and other information, recording of sintering data, and the ability to export for paperless recording;
4. Capable of remote control and real-time observation of equipment status;
5. Temperature correction: The difference between the main control temperature and the sample temperature is nonlinearly corrected throughout the sintering process.

Gas system (optional)

Flow meter type

rotameter

Mass flowmeter

Pipeline schematic diagram

Number of intake ports

2. 3, 4 (multiple options available)

Flow range

20-200/60-600l/min (multi range optional)

50/100/200sccm (multi range optional)

Range of working pressure difference

0-0.15MPa

Low vacuum system (optional)

Vacuum pump model

NBD-1.5C

NBD-3C

NBD-4C

pumping speed

1L/s

3L/s

4L/s

Inlet and exhaust port size

Φ8mmPagoda joint

Φ8mmPagoda joint

KF16/25

limiting pressure

1000Pa

100Pa

10Pa

operation temperature

5-40

Electrical specifications

AC220V

Molecular pump high vacuum system
(Optional)

Molecular pump system model

NBD-103(A)

NBD-103(B)

NBD-103(C)

pumping speed

110L/s

600L/s

700L/s

Vacuum gauge

Composite vacuum gauge

limiting pressure

10^-3Pa

10^-4Pa

10^-5Pa

operation temperature

5-40

Electrical specifications

AC 220V

AC 220V

AC 380V

*Support non-standard customization. For more models, please call 400-000-3746 for inquiries

Disclaimer: The product introduction content on this website (including product images, product descriptions, technical parameters, etc.) is for reference only. Due to delayed updates, there may be some discrepancies between the content and the actual situation. Please contact our customer service personnel for confirmation. The information provided on this website does not constitute any offer or commitment. Nuobadi Company may periodically improve and modify any information on the website without prior notice.

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After-sales service: 0371-6320 2805
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Mr.Gao: 188-3829-0747
Ms.Huang: 188-3829-0748
Email : nbd@nbdkj.com
Address:8# zhuyuan, Xinhua subdistrict, Xinzheng, Zhengzhou, China
Contact Us
Sale Service: 0371-6320 2801
                      0371-6320 2805
After-sales service: 0371-6320 2805
MR. CAI: 181-0371-5723
Email : nbd@nbdkj.com
Address:8# zhuyuan, Xinhua subdistrict, Xinzheng, Zhengzhou, China
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