Rf independent system
Release time: 2020-04-11 08:57:55 Number of views: 2369
The RF power dispenser is compact, lightweight and has an air-cooled design. High quality components and a smaller number of parts increase reliability and product life, making good use of your investment and process productivity. An intuitive, quick operation menu (toggled on the component's multifunctional front panel and displayed on a 128 x 64 pixel LCD) brings unmatched convenience -- increasing operator efficiency and keeping training costs low. Equipped with a 13.56MHz RF output, this device is suitable for plasma enhanced chemical vapor deposition (PECVD) use in conventional tubular stoves, making it an ideal choice for PECVD coating in laboratories.
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The RF power dispenser is compact, lightweight and has an air-cooled design. High quality components and a smaller number of parts increase reliability and product life, making good use of your investment and process productivity. An intuitive, quick operation menu (toggled on the component's multifunctional front panel and displayed on a 128 x 64 pixel LCD) brings unmatched convenience -- increasing operator efficiency and keeping training costs low. Equipped with a 13.56MHz RF output, this device is suitable for plasma enhanced chemical vapor deposition (PECVD) use in conventional tubular stoves, making it an ideal choice for PECVD coating in laboratories.
Configuration
Item | power range | working frequency | Power stability | reflection power | Protection setting | ||
0-500W Continuing Adjust | 13.56MHz | ≤2W | 70W | DC over current protection, power amplifier over temperature protection, reflection power protection |
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* This device can be customized to match tubular furnaces |
Disclaimer:
The product introduction content of this site (including product pictures, product descriptions, technical parameters, etc.) is for reference only. There may be some difference between the stated content and the actual situation due to the delay in updating. Please contact our customer service staff for confirmation. The information provided by this Site does not constitute any offer or acceptance. NOBODY will improve and modify any information on this site from time to time without prior notice.
The RF power dispenser is compact, lightweight and has an air-cooled design. High quality components and a smaller number of parts increase reliability and product life, making good use of your investment and process productivity. An intuitive, quick operation menu (toggled on the component's multifunctional front panel and displayed on a 128 x 64 pixel LCD) brings unmatched convenience -- increasing operator efficiency and keeping training costs low. Equipped with a 13.56MHz RF output, this device is suitable for plasma enhanced chemical vapor deposition (PECVD) use in conventional tubular stoves, making it an ideal choice for PECVD coating in laboratories.
Configuration
Item | power range | working frequency | Power stability | reflection power | Protection setting | type of cooling | |
plasma generator | 0-500W Continuing Adjust | 13.56MHz | ≤2W | 70W | DC over current protection, power amplifier over temperature protection, reflection power protection |
| |
* This device can be customized to match tubular furnaces |
Disclaimer:
The product introduction content of this site (including product pictures, product descriptions, technical parameters, etc.) is for reference only. There may be some difference between the stated content and the actual situation due to the delay in updating. Please contact our customer service staff for confirmation. The information provided by this Site does not constitute any offer or acceptance. NOBODY will improve and modify any information on this site from time to time without prior notice.
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