PECVD Plasma Chemical Vapor Deposition System

Release time: 2020-04-10 15:09:09  Number of views: 2485


设备简介:

该产品是由固态等离子源、气体质子流量控制系统、衬底控温系统、真空系统组成,采用集中总线控制技术的诺巴迪操作软件。适用于室温至1200℃条件下进行SiO2、SiNx薄膜的沉积,同时可实现TEOS源沉积,SiC膜层沉积以及液态气态源沉积其它材料,尤其适合于有机材料上高效保护层膜和特定温度下无损伤钝化膜的沉积。








配置详情

1. 清洗镀膜一气呵成,杜绝二次污染;

2. 上开启式结构,方便观察试样;

3. 产品采用全自动控制方式,触摸屏,数字化显示;

4. 设备一体化程度高;

5. 稳定的射频电源,均匀的温度分布,提高成膜质量;

产品型号

NBD-PECVD1200-80TI

电气规格

AC220V    4KW

可达温度

1200 ℃

连续温度

1150 ℃

可达加热速率

≤  20 ℃/分钟

射频电源

500W   13.56MHz

炉管尺寸

Φ80*1200mm

沉积示意图

如图所示:此为该设备沉积过程中的示意图

控制系统

1.NBD-101EP嵌入式操作系统中英文互换图形界面,7寸真彩触屏输入,智能式人机对话模式,实时加热功率显示,非线性式样温度修正;实验报告自主生成,实验数据无限次导出。

2.实验过程更加直观,操作更加便捷;

3.具有超温报警、断偶提示、漏电保护等功能。

温度精度

+/- 1 ℃

加热元件

Mo掺杂的Fe-Cr-Al合金

密封系统

真空度:≤10Pa(机械泵)

压力测量与监控

采用数显真空计,可使设备真空度更加直观,实验结果更加准确。

供气系统

采用两路质子流量计精确控制气体流速,与设备集成为一体;

净重

360KG

设备使用注意事项

1. 设备炉膛温度≥300℃时,禁止打开炉膛,避免受到伤害;

2. 设备使用时,炉管内压力不得超过0.125MPa(绝对压力),以防止压力过大造成设备损坏;

3. 真空下使用时,设备使用温度不得超过800℃。

4. 供气钢瓶内部气压较高,向炉管内通入气体时,气瓶上必须安装减压阀,建议在选购试验用小压力减压阀,减压阀量程为0.01MPa-0.15MPa,使用时会更加精确安全。

5.当炉体温度高于1000℃时,炉管内不可处于真空状态,炉管内的气压需和大气压 相当,保持在常压状态;

6.高纯石英管的长时间使用温度≦1100℃

7.加热的实验时,不建议关闭炉管法兰端的抽气阀和进气阀使用。若需要关闭气阀对样品加热,则需时刻关注压力表的示数,若气压表示数大于0.02MPa,必须立刻打开排气端阀门,以防意外发生(如炉 管破裂,法兰飞出等)


服务支持

1年质保,提供终身支持(保修范围内不包括易耗部件,例如炉管和密封圈等)。


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Product Description:

This product consists of a solid-state plasma source, gas proton flow control system, substrate temperature control system, and vacuum system. It uses Nobady operation software with centralized bus control technology. Suitable for the deposition of SiO2, SiNx films under conditions ranging from room temperature to 1200°C. It can also achieve TEOS source deposition, SiC film deposition, and deposition of other materials from liquid or gaseous sources. It is particularly suitable for the deposition of efficient protective layers on organic materials and non-damaging passivation films at specific temperatures.








Configuration details

1. The cleaning and coating process is completed in one go, eliminating secondary contamination;

2. The top-opening structure facilitates sample observation; 3. The product adopts an automatic control system with a touch screen and digital display; 4. The equipment has a high degree of integration; 5. A stable RF power supply and uniform temperature distribution improve film quality;

Product model

NBD-PECVD1200-80TI

Electrical specifications

AC220V    4KW

Reachable Temperature

1200 ℃

Continuous temperature

1150 ℃

Heating rate achievable

≤  20 ℃/分钟

RF power supply

500W   13.56MHz

Furnace tube size

Φ80*1200mm

Sedimentation diagram

As shown in the figure: This is a schematic diagram of the deposition process of the device.

Control system

1. The NBD-101EP embedded operating system features a bilingual graphical interface for English and Chinese, a 7-inch true color touch screen input, an intelligent human-machine dialogue mode, real-time heating power display, and non-linear sample temperature correction; it can automatically generate experimental reports and export experimental data an unlimited number of times.

2. The experimental process is more intuitive, and the operation is more convenient; 3. It has functions such as over-temperature alarm, open-couple prompt, and leakage protection.

Temperature accuracy

+/- 1 ℃

Heating element

Mo-doped Fe-Cr-Al alloy

Sealed system

Vacuum degree: ≤10Pa (mechanical pump)

Pressure measurement and monitoring

Using a digital vacuum gauge can make the equipment's vacuum level more intuitive and the experimental results more accurate.

Gas supply system

Adopt two-way proton flow meters to precisely control the gas flow rate, integrated with the equipment.

Net weight

360KG

Precautions for using the equipment

1. When the equipment furnace temperature is ≥300°C, do not open the furnace to avoid injury;

2. During equipment use, the pressure inside the furnace tube must not exceed 0.125MPa (absolute pressure) to prevent excessive pressure from damaging the equipment; 3. When using under vacuum conditions, the operating temperature of the equipment must not exceed 800°C. 4. The internal gas pressure in the gas supply steel cylinder is relatively high. When introducing gas into the furnace tube, a pressure reducing valve must be installed on the cylinder. It is recommended to purchase a small pressure reducing valve for experimental use, with a range of 0.01MPa-0.15MPa, which will be more precise and safe during use. 5. When the furnace body temperature exceeds 1000°C, the furnace tube must not be in a vacuum state; the pressure inside the furnace tube should be equivalent to atmospheric pressure, maintaining a normal pressure state; 6. The long-term operating temperature of high-purity quartz tubes should be ≤1100°C 7. During heating experiments, it is not recommended to close the exhaust valve and inlet valve at the flange end of the furnace tube. If it is necessary to heat the sample with the gas valves closed, the pressure gauge reading must be monitored at all times. If the pressure gauge reading exceeds 0.02MPa, the exhaust valve must be opened immediately to prevent accidents (such as furnace tube rupture or flange flying out).


Service Support

1-year warranty, lifetime support provided (warranty does not cover consumable parts such as furnace tubes and seals).


Disclaimer: The product introductions on this site (including product images, descriptions, and technical parameters) are for reference only. There may be discrepancies between the stated information and actual conditions due to untimely updates; please contact our customer service personnel for confirmation. The information provided on this site does not constitute any offer or commitment. Nobady Company reserves the right to improve and modify any information on the website periodically without prior notice.


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After-sales service: 0371-6320 2805
MR. CAI: 181-0371-5723
Email : nbd@nbdkj.com
Address:8# zhuyuan, Xinhua subdistrict, Xinzheng, Zhengzhou, China
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