PECVD plasma chemical vapor deposition system
Release time: 2017-11-15 06:29:24 Number of views: 8274
Equipment introduction:
The product is composed of solid state plasma source, gas proton flow control system, substrate temperature control system, vacuum system, using centralized bus control technology of Nobardi operating software. It is suitable for SiO2 and SiNx film deposition at room temperature to 1200℃, and can realize TEOS source deposition, SiC film deposition and liquid gas source deposition of other materials. It is especially suitable for high efficiency protective film on organic materials and non-damaging passivation film deposition at specific temperature.
| Equipment introduction: The product is composed of solid state plasma source, gas proton flow control system, substrate temperature control system, vacuum system, using centralized bus control technology of Nobardi operating software. It is suitable for SiO2 and SiNx film deposition at room temperature to 1200℃, and can realize TEOS source deposition, SiC film deposition and liquid gas source deposition of other materials. It is especially suitable for high efficiency protective film on organic materials and non-damaging passivation film deposition at specific temperature.
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Configuration
1. Cleaning and coating in one go, eliminate secondary pollution; | ||||||||||
Model | NBD-PECVD1200-80TI | |||||||||
Electrical Spec | AC220V 4KW | |||||||||
Tmax | 1150℃ | |||||||||
Heating rate | ≤ 20℃/min | |||||||||
RF power | 300 or 500W 13.56MHz | |||||||||
Tube size | Φ80*1200mm | |||||||||
Deposition diagram | This is a diagram of the deposition process of the device | |||||||||
Control system | 1.NBD-101EP embedded operating system Chinese and English interchange graphical interface, 7 inch real color touch screen input, intelligent man-machine dialogue mode, real-time heating power display, non-linear pattern temperature correction; The experimental report is generated independently, and the experimental data is exported for unlimited times. | |||||||||
Temp Accuracy | +/- 1 ℃ | |||||||||
Heating element | Mo-doped Fe-Cr-Al alloy | |||||||||
Sealing system | ||||||||||
Vacuum degree: ≤10Pa (mechanical pump) | ||||||||||
Pressure measurement and monitoring | The use of digital display vacuum gauge can make the vacuum degree of equipment more intuitive and the experimental results more accurate. | |||||||||
Gas supply system | Using two mass flowmeters to accurately control the gas flow rate, integrated with the equipment; | |||||||||
Net weight | 360KG | |||||||||
Cautions | 1. When the furnace temperature of the equipment is greater than or equal to 300℃, it is forbidden to open the furnace to avoid injury; | |||||||||
Service | 1 year warranty with lifetime support (the warranty does not cover consumable parts, such as furnace tubes and sealing rings). |
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Phone: 400-000-3746
0371-6320 2805
After-sales service: 0371-6320 2805
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