The CVD (Chemical Vapor Deposition) system is an advanced material fabrication technology that deposits solid thin films onto substrates through vapor-phase chemical reactions. With its advantages of uniform film formation, high purity, strong adhesion, low-temperature deposition capability, and controllable composition/structure, the CVD system has been widely applied in various high-tech fields. Below are its primary application areas:

1. Semiconductor and Microelectronics Industry (Core Applications)

Integrated circuit (IC)

Deposition of SiO₂ (insulation layer), Si₃N₄ (passivation/mask layer), polysilicon (gate), W/Cu (metal interconnect);

advanced packaging

Preparation of low-k dielectric materials and barrier layers (such as Ta/TaN);

Power devices and RF devices

Growth of SiC and GaN epitaxial layers for high-voltage, high-frequency, and high-temperature devices.

Key requirements: high purity, nanoscale thickness control, large-area uniformity, and cleanroom compatibility.

II. Photovoltaics and New Energy

Crystalline silicon solar cells

Deposition of SiNx anti-reflection/passivation film (mainstream PECVD process);

Thin-film solar cells

Preparation of amorphous silicon (a-Si), microcrystalline silicon (μc-Si), and CIGS absorption layers;

Perovskite solar cells

Deposition of hole transport layers (such as Spiro-OMeTAD alternatives), encapsulation barrier layers (Al₂O₃, SiO₂);

Fuel cell/ electrolyzer

Preparation of catalytic electrode coatings (e.g., Pt/C, IrO₂).

III. Two-Dimensional Materials and Nanotechnology (Frontier Research Trends)

graphene

Large-area monolayer/few-layer graphene was grown on Cu/Ni foils via CH₄/H₂ CVD;

Transition metal dichalcogenides (TMDs)

Such as MoS₂, WS₂, WSe₂, used in flexible electronics and optoelectronic devices;

Hexagonal boron nitride (h-BN)

As an ideal insulating substrate or encapsulation layer for two-dimensional devices;

Carbon nanotubes (CNTs)

Catalytic CVD enables controlled growth of vertical arrays or horizontal networks.

Characteristics: Precise control of precursor ratios, temperature gradients, and growth time is required to regulate the number of layers, grain domain size, and defect density.

5. Hard Coatings and Tool Enhancement (Industrial Applications)

Surface strengthening of cutting tools/molds

Deposition of TiN, TiCN, Al₂O₃, and DLC (diamond-like carbon) coatings to enhance wear resistance and lifespan;

Aerospace components

Preparation of interfacial coatings for SiC/SiC ceramic matrix composites;

Artificial joints/medical devices

Deposited biocompatible DLC or SiOₓ coatings.

VI. Energy Storage and Catalysis

Lithium/sodium-ion batteries

Coating the electrode surface with atomic layers such as Al₂O₃ and TiO₂ (ALD is often combined with CVD) to suppress side reactions;

Prepare three-dimensional current collectors (such as CVD carbon foam);

electrocatalyst

Growth of single-atom catalysts (such as Fe-N-C) supported on carbon nanotube/graphene composites;

hydrogen storage materials

Constructing a nanoporous carbon skeleton for physical adsorption hydrogen storage.

7. Emerging Interdisciplinary Fields

Field Application Example

Flexible Electronics: CVD Graphene for Transparent Electrodes and Strain Sensors

Quantum Computing  

Epitaxial Growth of High-Purity Si/SiGe Heterostructures for Quantum Dot Devices

Functionalized CVD Diamond Films for Biosensing Applications in Neural Electrodes and DNA Detection

Environmental Protection: TiO₂ Photocatalytic Membranes for Water and Air Purification