Silane plasma cleaning coating system-Box furnace, tube furnace, ultra-high temperature sintering furnace

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Silane plasma cleaning coating system

Add Time： 2025-09-09 View：415

The silane plasma cleaning coating system firstly pumps the reaction chamber to vacuum to remove air impurities, and then inject precursor gases such as silane (SiH) in proportion. An electric field is applied to the reaction cavity by a radio frequency power supply to ionize the gas molecules to form a plasma. High-energy electrons in plasma collide with gas molecules and decompose them into positively charged ions, neutral radicals and other active species. Under the action of diffusion and el...

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	Highly integrated and multifunctional Cleaning coating integration: plasma cleaning and PECVD coating are completed in the same vacuum chamber, avoiding air pollution of the substrate during transfer and ensuring the cleanliness of the interface and excellent adhesion of the film. Multi process compatibility: By switching gas and process parameters, multiple functions can be achieved: Cleaning: O ₂ plasma to remove organic matter, Ar plasma physical sputtering to remove inorganic matter/activate surfaces. Coating: Use SiH ₄+NH ∝/N ₂ O to deposit silicon nitride (Si ∝ N ₄), use SiH ₄+N ₂ O/O ₂ to deposit silicon dioxide (SiO ₂), etc. 2、 High precision process control Accurate gas control: Equipped with a multi-channel high-precision mass flow controller (MFC), it can accurately and stably adjust the flow rate of process gases such as O ₂, Ar, SiH ₄, NH ∝, N ₂ O (usually with an accuracy of ± 1% FS). Advanced plasma control: Using radio frequency (RF, 13.56 MHz) power supply, the RF power can be adjusted within a wide range to meet different process requirements (high power is required for cleaning, and optimized power is needed for film formation to control film stress). Accurate temperature control: Adopting PID temperature control, the temperature control accuracy can reach 15 ℃, ensuring the uniformity and repeatability of the film-forming reaction. 3、 Efficiency and Automation Programmed automatic operation: Equipped with PLC or computer control system, supporting the writing and storage of multi-step process programs (Recipes). It can automatically complete the entire process of "vacuuming → cleaning (intake, ignition, timing) → exhaust → deposition (intake, boost, ignition, heating, timing) → exhaust → cooling → vacuum breaking", achieving unmanned operation. High repeatability: Automated control ensures a high degree of consistency in process results between different batches and operators. 4、 Safety and reliability Special safety design for silane: Silane is a highly toxic, flammable, and explosive gas. The system must have: Dedicated gas circuit: Use certified, leak proof pipelines and fittings. Leak detection: Equipped with silane gas detectors to monitor environmental leaks in real-time. 5、 Structure and Maintenance Modular design: Vacuum chambers, gas cabinets, power supplies, control cabinets, etc. often adopt modular design for easy maintenance, upgrading, and transportation. Human machine interface friendly: equipped with a touch screen or computer software, the operation interface is intuitive, and real-time monitoring of process parameters, alarm information, and historical data can be achieved. 6、 Performance characteristics High film quality: The deposited silicon nitride/silicon dioxide film has good uniformity, density, adhesion, and controllable stress (tensile stress/compressive stress). Low temperature process: PECVD technology can deposit high-quality thin films at relatively low temperatures of 200-400 ℃, suitable for substrates that are not resistant to high temperatures. Flexible production capacity: It can be designed as a single-chip, multi chip, or online system according to demand, suitable for research and development, pilot testing, or small-scale production.
Device Name	Silane plasma cleaning and coating system
Device Model	NBD-PECVD1200-100TID3ZYW-N
power supply	380V 50HZ three-phase five wire system frequency: 50Hz (PECVD: 230V (single-phase) exhaust gas treatment: 380V (three-phase)
rated power	8KW（PECVD4.5KW）
heating element	Alloy heating wire
Furnace temperature control accuracy	±1℃
sensor type	K-type thermocouple with a diameter of 2 * 420mm
Tmax	1200℃
Rated temperature	1150℃
Recommended heating rate	≤10℃/min
Furnace temperature zone size	φ150*295mm
Furnace tube size	Quartz tubeφ100*1200mm
Inductance coil (inductor coil)	internal diameter110mm
RF power	0—300WAdjustable (adjustable)
Mass flow meter1	S500 50SCCM 1/4VCRCalibration of connector nitrogen
Mass flow meter2	S500 100SCCM 1/4VCRCalibration of connector nitrogen
Mass flow meter3	S500 300SCCM 1/4VCRCalibration of connector nitrogen
Front stage pump	Pumping rate without oil pump WY-16 4.4L/s
Molecular pump, molecular pump	NBD-103A extraction rate 110L/s
Operating limit vacuum degree	7×10-3Pa
Furnace body size	L1660H2020D900mm
Dimension of tail gas treatment unit	L2950H2200D820mm
control system		1. Sintering process curve setting: dynamically display the set curve, and the equipment sintering can pre store multiple process curves, each of which can be freely set; 2. Pre order sintering is available to achieve unmanned sintering process curve sintering; 3. Real time display of sintering power, voltage and other information, recording of sintering data, and the ability to export for paperless recording; 4. Capable of remote control and real-time observation of equipment status; 5. Temperature correction: The difference between the main control temperature and the sample temperature is nonlinearly corrected throughout the sintering process.
Appointment sintering		Optimize equipment utilization, ensure sintering process stability, save waiting time, and achieve efficient and orderly sample preparation.
Nonlinear temperature correction		By using algorithms to nonlinearly correct the temperature deviation between the control point and the sample due to their different positions in the temperature field, the consistency between the control temperature and the sample temperature is improved, the operation is simplified, and the accuracy of experimental data is enhanced.
remote control		You can log in to the control system anytime and anywhere through computers, mobile phones, and other terminals to view the operating status of the heating furnace (temperature, pressure, heating rate, etc.), and remotely adjust parameters and start/pause programs according to experimental needs. No need to travel back and forth to the laboratory at night or on holidays to meet the parameter tuning needs during the experimental process; Real time monitoring of key experimental processes can also be achieved during cross regional business trips, significantly reducing ineffective commuting time and allowing researchers to allocate work energy more efficiently.
data storage		By using algorithms to nonlinearly correct the temperature deviation between the control point and the sample due to their different positions in the temperature field, the consistency between the control temperature and the sample temperature is improved, the operation is simplified, and the accuracy of experimental data is enhanced.
Multiple sets of exclusive process programs can be pre-set		Multiple types of experiment specific temperature programs can be preset to ensure experimental repeatability and ease of operation, support process optimization and data tracing, adapt to team collaboration and technical inheritance, greatly improving experimental efficiency and design flexibility.
temperature accuracy	+/- 1 ℃
heating element		Mo doped Fe Cr Al alloy
Vacuum degree:	10Pa (mechanical pump)
Net weight	about280KG
Equipment usage precautions	1. When the furnace temperature of the equipment is ≥ 300 ℃, it is forbidden to open the furnace to avoid injury; 2. When using the equipment, the pressure inside the furnace tube should not exceed 0.125MPa (absolute pressure) to prevent equipment damage caused by excessive pressure; 3. When used under vacuum, the operating temperature of the equipment should not exceed 800 ℃. 4. The internal pressure of the gas supply cylinder is relatively high. When introducing gas into the furnace tube, a pressure reducing valve must be installed on the cylinder. It is recommended to purchase a small pressure reducing valve for testing, with a range of 0.01MPa-0.15MPa, which will be more precise and safe to use. 5. When the temperature of the furnace body is higher than 1000 ℃, the furnace tube cannot be in a vacuum state. The pressure inside the furnace tube should be equivalent to atmospheric pressure and maintained at atmospheric pressure; 6. Long term use temperature of high-purity quartz tube ≤ 1100 ℃ 7. It is not recommended to close the exhaust and intake valves at the flange end of the furnace tube during heating experiments. If it is necessary to close the gas valve to heat the sample, it is necessary to constantly monitor the reading on the pressure gauge. The absolute pressure gauge reading should not exceed 0.15 MPa, and the exhaust valve must be opened immediately to prevent accidents (such as furnace tube rupture, flange flying out, etc.).
Service Support	One year limited warranty, providing lifetime support (the warranty does not include consumable parts such as processing tubes and O-rings, please order replacement parts at the relevant product below)

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